ANU, RSPhysSE, Electronic Materials Engineering (EME)

 

Address:

Department of Electronic Materials Engineering
Research School of Physical Sciences and Engineering
Australian National University
ACT 0200
Australia  

Phone:

+61 2 612 50020  

Fax:

+61 2 612 50511  

Email:

eme109@rsphysse.anu.edu.au  

Participants

Major Facilities

  • Two Ion Implanters (low and high energy ion implanter)
  • Two MOCVD Reactors (for III-V compound semiconductor multilayers) (metalorganic chemical vapour deposition)
  • Thin Film Deposition (resistive, e-beam, low-pressure chemical vapor deposition (LPCVD)and magnetron sputtering)
  • Dry Etching
  • Tube and Rapid Furnace Heating (RTA)
  • Reactive Ball Milling
  • Sample Thinning and Preparation
  • Double Crystal XRD (X-Ray Diffraction)
  • Powder XRD (X-Ray Diffraction)
  • Optical characterisation and testing including photoluminescence
  • Thermal Analysis and Thermogravimetry
  • High Energy Ion Beam Analysis
  • SIMS (Secondary Ion Mass Spectrometer)
  • Electrical Measurements including Hall, IV, CV, DLTS
  • Nanoindentation (Ultra-Micro Indentation System (UMIS) and triboindenters)
  • Access to Electron Microscopy and Atomic Force Microscopy (AFM) Facilities

Group Websites:

http://wwwrsphysse.anu.edu.au/eme